Industrial image processing and pattern recognition are key technologies for the products of tomorrow and a basis for intelligent quality assurance systems in producing companies. Interdisciplinary approaches from technical sciences, biology and psychology generate future-orientated solutions. Because of the increased use of image processing on the one hand new solutions are generated quickly, on the other hand challenges arise. This year’s colloquium focuses on industrial image processing systems with an emphasis on Industrial 4.0, approaches for image processing and pattern recognition for real-time systems, technical aspects of image processing and their application areas. For the fifth time the annual colloquium BVAu is organized by the research institutes GET Lab – technical cognitive Systems of Paderborn University and Institute Industrial IT of OWL University. The colloquium alternating takes place in Lemgo and Paderborn.
Interested in submitting a contribution? Authors can submit a meaningful abstract by May 20 via http://www.hs-owl.de/init/bvau2016/ (1000 words). Submissions in the field of industrial image processing as well as technological/methodological-oriented works are welcome.
Contact:
inIT - Institut für industrielle Informationstechnik
Hochschule Ostwestfalen-Lippe
Langenbruch 6
32657 Lemgo
Tel: +49 (0) 5261 702 2400
Fax: +49 (0) 5261 702 2409
E-Mail: info(at)init-owl.de
Homepage: http://www.hs-owl.de/init/bvau2016/